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Nx Technologies, together with DSS, LLC - the owner of a patented technology in the USA and Ukraine, called Localized Ion-Plasma Sputtering Technologies, can prepare a feasibility study for coating the inner surfaces of test barrels with Tantalum or Special Ni-Cr Borides RC45-50 Alloys and adapt above technologies to be used for barrels with an internal diameter of 5-11mm and a length of up to 1m, up to a diameter of 155mm and a length of up to 10m.

The efficient technology of sputtering ultra-pure metal nanoparticles in a vacuum for the above-mentioned devices was originally developed and patented by the authors in the USA: the method of localized ion-plasma sputtering (US patent 5591313 of 01.07.1997, APARATUS AND METHOD FOR LOCALIZED ION SPUTTERING, L. Kistersky et al.). This method allows the current density on the sputtered area to be significantly increased from 3000-4000 amperes per square meter produced by ordinary magnetron equipment to about 50,000 amperes per square meter of sputtered cathode for localized ion-plasma sputtering.An additional advantage of this technology is the possibility of using multiple devices for localized ion-plasma sputtering connected in parallel to one high-voltage power source, which increases the efficiency of metal nanodispersion and allows the coating of hard and liquid surfaces on a production scale. An improved device for localized ion plasma sputtering (ELIPS Plasmatron) was developed based on the above method, and the relevant know-how with all technological regimes can be patented for a specific application as an industrial technology with implementation at the customer's site.It is possible to coat Tantalum with high thermal resistance, and various metals for specialized needs, including dozens of other metals or alloys such as Platinum, Titanium and SilverThe thin layer of Tantalum produced in this way, with low porosity and high adhesion, is applied in a low-temperature process that does not damage the substrate. The NanoTantal layer with a thickness of 0.5 micron corresponds to the preservation and protective parameters of the layer of standard chromium with a thickness of 0.5 mm